论文部分内容阅读
通过电化学沉积方法制备了Co-Mo-P磁性薄膜。对电化学沉积速率、薄膜成分、微结构及磁性能进行了研究。结果表明,镀液温度是影响Co-Mo-P电化学沉积的主要因素。薄膜组成对Co-Mo-P的微结构及磁性能有很大影响。当次磷酸钠的浓度从0mol/L增到0.05mol/L时,在XRD图谱上观察到相变。在沉积电流密度为20mA/cm2,沉积温度为40℃,薄膜中P含量为6.05at%([H2PO2-]=0.02mol/L)时,得到的薄膜饱和磁化强度为139(A·m2)/kg,矫顽力为6926Am-1。在此条件下所制备的薄膜具有良好的软磁性。
Co-Mo-P magnetic thin films were prepared by electrochemical deposition. The electrochemical deposition rate, film composition, microstructure and magnetic properties were studied. The results show that the bath temperature is the main factor affecting the electrochemical deposition of Co-Mo-P. The film composition has a great influence on the microstructure and magnetic properties of Co-Mo-P. When sodium hypophosphite concentration increased from 0 mol / L to 0.05 mol / L, a phase transition was observed on the XRD pattern. The saturation magnetization of the obtained film was 139 (A · m2) / cm 2 at a deposition current density of 20 mA / cm 2, a deposition temperature of 40 ° C and a P content of 6.05 at% ([H2PO2 -] = 0.02 mol / L) kg, coercivity of 6926Am-1. The films prepared under these conditions have good soft magnetic properties.