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电子束曝光是近代微电子技术中最引人注目的一项新技术。我所按照科学院指示,开展了为电子束曝光机用的精密工件台系统的研制工作。在研制中涉及到其中一些钢件的退磁问题。电子束曝光是将电子枪发出的高速电子通过电磁透镜聚焦成细电子束,在涂有光致抗蚀剂(光刻胶)的铬(或氧化铁)版上逐点扫描曝光来制作掩模版或直接在涂有光致抗蚀剂(光刻胶)的硅片上进行光刻的。因
Electron beam exposure is the most remarkable new technology in modern microelectronics. In accordance with the instructions of the Academy of Sciences, I conducted the research and development of a precision workpiece table system for electron beam lithography. Involved in the development of some of the steel demagnetization problems. Electron beam exposure is the electron gun emits high-speed electrons through the electromagnetic lens into a fine electron beam, coated with a photoresist (photoresist) of chromium (or iron oxide) version of the point-by-point scanning exposure to create a reticle or directly Photolithography was performed on a silicon wafer coated with a photoresist (photoresist). because