Optical design for EUV lithography source collector

• 作 者: 张树青 王骐 祝东远 李润顺 刘畅
• 机 构: Research Center for Space Optical Engineering,Harbin Institute of Technology,Institute of Opto-Elect
• 出 处: Chinese Optics Letters
• 发表日期: 2011年05期
• 关键词: collector lithography mirror mirrors ultraviolet coordinates outer satisfying co

Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors. It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus (IF). A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced. Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated. The design results indicate that the collector satisfies all the requirements.

Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors. It has a high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus (IF). A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced. Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated. The design results indicate that the the collector satisfies all the requirements.