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在多束动态混合(MBMI)-注入系统上利用MBMI技术制备TiN膜,XRD分析表明,N+入射角度α(°)、氮钛原子到达比RN/Ti、 N2分压PN2对膜生长的择优取向及相结构有影响;性能研究结果表明。高的入射离子能量Ei、基体温度Ts以及合适的RN/Ti对TiN膜的显微硬度HK和膜-基结合力都有正面影响。
The TiN films were prepared by multi-beam dynamic mixing (MBMI) -injecting system using MBMI technology. The XRD results showed that the preferred orientation of the film growth was N α at the incident angle α (°) And phase structure have an impact; performance research results show. High incident ion energies Ei, substrate temperature Ts, and appropriate RN / Ti have a positive effect on the microhardness HK and film-substrate adhesion of TiN films.