论文部分内容阅读
1.引言 获得一个洁净的表面对Ⅲ-Ⅴ族化合物光电阴极、薄膜科学、热压粘结、半导体外延技术以及其它现代表面工艺是至关重要的。物体表面吸附的污染物是各种各样的。最常见的是氧化物、碳氢化合物和各种气体。为了清除这些吸附物,人们曾采取多种措施,如用各种化学溶剂清洗、真空加热清洁、电子轰击、等离子体轰击以及氩离子溅射等等。这些清洁方法都各起其特有的作用。如化学溶剂和真空加热清洁方法,能
I. INTRODUCTION Achieving a clean surface is essential for the group III-V compound photocathode, thin film science, thermocompression bonding, semiconductor epitaxy, and other modern surface finishes. The pollutants adsorbed on the surface of the object are various. The most common are oxides, hydrocarbons and various gases. In order to remove these adsorbents, various measures have been taken such as cleaning with various chemical solvents, vacuum heating and cleaning, electron bombardment, plasma bombardment, argon ion sputtering and the like. Each of these cleaning methods has its unique effect. Such as chemical solvents and vacuum heating cleaning methods, can