薄膜X射线衍射仪

• 作 者: 蔡兆勋
• 出 处: 上海金属.有色分册
• 发表日期: 1992年06期
• 关键词: 薄膜 衍射仪 射线 衍射强度 硅单晶 蒸发法 衍射线 聚合物 测量方法 图形

利用X射线衍射法研究通过蒸发法沉积在玻璃、硅单晶、金属或聚合物等基体上的薄膜越来越受到重视。但是,采用常规的衍射仪,由于这种薄膜的X射线衍射强度很弱,结果是背景相当高,难以获得明晰的X线衍射图形。作为对这种弱衍射线的测量方法,一种途径是使X射线相对于样品表面成一个小角度入射到样品上,以便有效地检出来自薄膜的衍射X射线。据报导,日本理学公司已经开发了使用这种技术的一种新型薄

The use of X-ray diffraction method to study the evaporation method deposited on glass, silicon single crystal, metal or polymer matrix more and more attention. However, with the conventional diffractometer, since the X-ray diffraction intensity of such a thin film is weak, the background is quite high, making it difficult to obtain a clear X-ray diffraction pattern. As a measure of this weak diffraction line, one approach is to have the X-rays incident on the sample at a small angle relative to the sample surface in order to effectively detect diffracted X-rays from the film. It has been reported that Rigaku Corporation of Japan has developed a new type of thin film using this technique