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由于激光烧蚀靶材形成的等离子体羽辉呈高斯分布,导致沉积的大面积薄膜尤其是球面衬底上的薄膜极不均匀,严重限制了脉冲激光沉积法的应用。设计构建了旋转与变速摆动相结合的三维衬底机构,实现对半球面不同区域的连续沉积,保证了膜层的均匀性;建立膜厚分布的数学模型,模拟分析了运动参数对膜厚分布的影响;首次利用脉冲激光沉积技术制备出口径200 mm大尺寸半球面衬底上的均匀类金刚石膜,顶角80°范围内膜厚不均匀性≤±5%。脉冲激光沉积法在大口径半球面衬底上制备均匀类金刚石膜在空间观测等领域均具有巨大的应用前景。
Due to the Gaussian distribution of the plasma plumes formed by the laser ablation target, the films deposited on the large area film, especially the spherical substrate, are very non-uniform, which severely limits the application of pulsed laser deposition. Design and build a three-dimensional substrate mechanism combining rotation and variable speed swing to realize continuous deposition on different regions of the hemispherical surface to ensure the uniformity of the film layer. A mathematical model of the film thickness distribution is established, and the influence of the motion parameters on the film thickness distribution The uniform diamond-like carbon film on a 200 mm diameter hemispherical substrate with a diameter of 80 ° is produced by pulsed laser deposition for the first time. Pulsed laser deposition of uniform diamond-like carbon films on large-diameter hemispherical substrates has great potential applications in the field of space observation.