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二氧化硅或氮化硅等介质层,在半导体集成电路的制造过程中起着掩蔽和钝化的作用。这些介质的不完整性,例如针孔,是影响集成电路,特别是大规模集成电路成品率及其失效的重要因素之一。因此,检查并消除针孔的方法也就越来越引起人们的注意。很多有关针孔检查的方法,国内外均有过报导和介绍。然而我们经过实践和分析,感到这些方法有的比较烦琐,有的不易掌握,有的不很准确。现在介绍的阳极氧化铝检
Dielectric layers, such as silicon dioxide or silicon nitride, act as masking and passivation in the fabrication of semiconductor integrated circuits. Incompleteness of these media, such as pinholes, is one of the most important factors that affect the yield and failure of integrated circuits, especially large scale integrated circuits. Therefore, the method of inspecting and eliminating the pinhole also gets more and more attention. Many methods of pinhole inspection have been reported and introduced both at home and abroad. However, after practice and analysis, we feel that some of these methods are cumbersome, some are not easy to grasp, and others are not very accurate. Now anodized aluminum inspection