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建立了一个分子动力学模型以研究脉冲激光沉积金属薄膜的成膜过程，探讨激光沉积中极高的瞬时沉积率和载能粒子轰击对成模机制的影响。以能量为10eV的Cu原子入射到Cu（100）表面为例，进行了分子动力学模拟的计算。结果表明，激光成膜过程中载能粒子的瞬时高通量沉积极大地增加了外延表面的原子扩散活性，促使薄膜能在低温下以原子层尺度逐层生长。
A molecular dynamics model was established to study the film-forming process of pulsed laser deposited metal thin films. The effects of instantaneous deposition rate and loading particle bombardment on the molding mechanism were discussed. Taking the energy of 10eV Cu atoms incident on the surface of Cu (100) as an example, molecular dynamics simulation was carried out. The results show that the transient high-flux deposition of the loaded particles during the laser film-forming process greatly increases the atomic diffusion activity of the epitaxial surface and enables the film to grow layer by layer at low temperature.