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The lossy nature of plasmonic wave due to absorption is shown to become an advantage for scaling-up a large area surface nano-texturing of transparent dielectrics and semiconductors by a self-organized sub-wavelength energy deposition leading to an ablation patte--ripples-using this plasmonic nano-printing.Irreversible nanoscale modifications are delivered by surface plasmon polariton (SPP) using:(i) fast scan and (ii) cylindrical focusing of femtosecond laser pulses for a high patteming throughput.The mechanism of ripple formation on ZnS dielectric is experimentally proven to occur via surface wave at the substrate-plasma interface.The line focusing increase the ordering quality of ripples and facilitates fabrication over wafer-sized areas within a practical time span.Nanoprinting using SPP is expected to open new applications in photo-catalysis,tribology,and solar light harvesting via localized energy deposition rather scattering used in photonic and sensing applications based on re-scattering of SPP modes into far-field modes.