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采用化学溶液方法(CSD)在立方双轴织构的NiW合金基底上制备出了CeO2/La2Zr2O7(LZO)过渡层。利用常规XRD和XRD四环衍射仪对薄膜的取向进行了研究,结果显示CeO2薄膜和LZO薄膜具有很强的面内和面外取向,其中,CeO2(111)面φ扫描的半高宽值(FWHM)约8.35°,(200)面ω扫描的FWHM值约为6.54°。用高分辨扫描电子显微镜观察到薄膜表面致密平整,没有裂纹和孔洞。原子力显微镜测试结果表明,在30μm×30μm范围内,CeO2薄膜表面均方根粗糙度(Rrms)为5.9nm。
The CeO2 / La2Zr2O7 (LZO) transition layer was prepared on a cubic biaxially textured NiW alloy substrate by chemical solution method (CSD). The orientation of the films was investigated by conventional XRD and XRD four-ring diffractometry. The results show that the CeO2 thin films and LZO thin films have strong in-plane and out-of-plane orientations. The half-width value of the CeO2 (111) FWHM) of about 8.35 °, and the FWHM value of the (200) plane ω scan is about 6.54 °. High-resolution scanning electron microscopy showed that the film surface was dense and smooth, with no cracks and holes. The atomic force microscopy test results show that the root mean square roughness (Rrms) of the CeO2 thin film surface is 5.9 nm in the range of 30 μm × 30 μm.