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研制了１种用在离子束细胞刻蚀装置中的小型腔式微波离子源，它由石英放电管、同轴谐振腔和封装在管一端的二电极引出系统组成。该源由同轴腔激发起的表面波在石英管内产生等离子体柱。为了提高柱末端等离子体离子引出流密度，选用了在内径７．０ｍｍ直管的一端加上一内径５．０ｍｍ衬管的放电管。在微波频率为２．４５ＧＨｚ，输入功率为９３Ｗ下，氮的引出流密度分别为４８．４ｍＡ／ｃｍ２和９１．７ｍＡ／ｃｍ２。这种表面波放电等离子体源体积小、结构简单，可在较宽的压强范围内产生重复性好、工作稳定的等离子体柱。
A small cavity microwave ion source used in ion beam cell etching equipment was developed. It consists of a quartz discharge tube, a coaxial resonator and a two-electrode lead-out system enclosed at one end of the tube. The source is excited by the coaxial cavity surface wave generated within the quartz tube plasma column. In order to improve the plasma current at the end of the column, the discharge tube with an inner diameter of 5.0 mm was attached to one end of a straight tube with an inner diameter of 7.0 mm. At a microwave frequency of 2.45 GHz and an input power of 93 W, the nitrogen outflow densities were 48.4 mA / cm2 and 91.7 mA / cm2, respectively. This surface wave discharge plasma source is small in volume and simple in structure and produces a plasma column with good reproducibility and stable operation over a wide pressure range.