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近日在横浜召开的“ＬＣＤ／ＰＤＰ Ｉｎｔｅｒｎａｔｉｏｎａｌ ２０００”上，制造商争相展示低温多晶Ｓｉ－ＴＦＴ液晶的生产设备。特别引人注目的是形成Ｓｉ多晶化的退火（Ａｎｎｅａｌ）设备以及用于形成晶体管的离子注入设备。退火设备在批量生产大型玻璃基板方面取得了
Recently held in Yokohama “LCD / PDP International 2000”, manufacturers competing to show low-temperature poly-Si-TFT LCD production equipment. Of particular interest are Anneal devices that form Si polycrystallization and ion implantation devices that are used to form transistors. Annealing equipment has been achieved in mass production of large glass substrates