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磁控溅射ITO靶材制备ITO透明导电薄膜作为平板显示、太阳能电池、气敏元件等电子器件的电极材料,需要ITO靶材具有高纯度、高均匀性、高密度、高导电性的特点。对比研究了ITO共沉淀粉与In_2O_3、SnO_2单体混合粉同炉烧结ITO靶材的微观组织结构差异,如:晶粒尺寸分布、晶粒形貌、元素分布、烧结速率等。结果表明:单体混合粉的烧结速率要比共沉淀粉的烧结速率高,但是前者烧结ITO靶材的微观组织结构不及后者烧结的均匀性好。对比而言,共沉淀粉更容易获得结构组织均匀的ITO靶材,但前提是要合理的设计烧结工艺抑制烧结过程中In_2O_3的分解。研究结果将会对提高ITO靶材微观组织均匀性和减少靶材毒化,进而提高靶材生产效率提供有益的参考。
Preparation of ITO Transparent Conductive Film by Magnetron Sputtering ITO Target As an electrode material for flat panel display, solar cell, gas sensor and other electronic devices, ITO target needs high purity, high uniformity, high density and high conductivity. The microstructural differences of ITO coprecipitated powder and In 2 O 3, SnO 2 mixed powder sintered ITO targets were compared and studied, such as grain size distribution, grain morphology, elemental distribution and sintering rate. The results show that the sintering rate of monomer powder is higher than that of coprecipitated powder. However, the microstructure of the former sintered ITO target is not as good as the latter. In contrast, coprecipitated powder is easier to obtain ITO target material with uniform structure and structure, but the premise is to reasonably design the sintering process to restrain the decomposition of In 2 O 3 during sintering. The results will provide a useful reference for improving the uniformity of the microstructure of ITO targets and reducing the poisoning of target materials, thereby increasing the production efficiency of target materials.