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简单介绍了新开发的ＣＨ钝化工艺及其特点，用恒电量技术对比测试了ＣＨ钝化工艺形成的钝化膜和常规钝化膜，ＣＨ钝化膜的Ｒｐ、Ｒｆ值大，Ｃｄ、Ｃｆ值小；再应用循环伏安法在－１．０２～－１．６８Ｖ范围进行测试，发现ＣＨ钝化膜的循环伏安图经１０次循环后仍与第一次的一样。两种测试说明了ＣＨ钝化膜比常规钝化膜的耐蚀性高。两种电化学测试的结果与其它方法测试的结果一致
The newly developed CH passivation process and its characteristics were briefly introduced. The passivation film and conventional passivation film formed by CH passivation process were compared by constant charge technology. The Rp and Rf values of CH passivation film were large, and Cd and Cf The value of small; then applied cyclic voltammetry in the -1.02 ~ -1.68V range of tests and found that CH passivation film cyclic voltammetry after 10 cycles still the same as the first. Both tests show that the corrosion resistance of the CH passivation film is higher than that of the conventional passivation film. The results of the two electrochemical tests are consistent with the results of the other method tests