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以制备兼具阳光控制和低辐射功能的镀膜玻璃为目的,以硅烷与四氯化钛为反应前驱体,氮气为保护气体和稀释气体,通过常压化学气相沉积法模拟玻璃浮法在线镀膜工艺,在玻璃基板上成功制备了Ti5Si3薄膜,用X射线衍射、场发射扫描电子显微镜、四探针测阻仪和分光光度计对薄膜的相结构、形貌、电学、光学性能进行了表征。结果表明:薄膜为六方结构的Ti5Si3晶相,晶相含量较高,晶粒尺寸为23nm,薄膜中的晶粒以200nm左右的多晶颗粒团聚体形式存在。薄膜电阻率为122μΩ·cm,与Ti5Si3晶体的本征电阻率相当。这种单层镀膜玻璃的红外反射率可高达92.1%,可见光区的透过率为25%,兼具阳光控制和低辐射功能。
For the purpose of preparing coated glass with both sunlight control and low radiation function, silane and titanium tetrachloride were used as precursors and nitrogen was used as protective gas and diluent gas to simulate the glass float coating process by atmospheric pressure chemical vapor deposition Ti5Si3 thin films were successfully prepared on glass substrates. The phase structure, morphology, electrical and optical properties of the films were characterized by X-ray diffraction, field emission scanning electron microscopy, four-probe resistance meter and spectrophotometer. The results show that the film is a hexagonal Ti5Si3 crystal phase with a high content of crystal phase and a grain size of 23nm. The crystal grains in the film exist as agglomerates of polycrystalline particles with a size of about 200nm. The resistivity of the film is 122μΩ · cm, which is equivalent to the intrinsic resistivity of Ti5Si3 crystal. The single-layer coated glass has an infrared reflectance of up to 92.1% and a visible light transmittance of 25%, with both sun control and low-emissivity.