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分步投影光刻机(Stepper)是利用光学投影成像的原理将 IC 图形以分步重复曝光的形式成像在涂胶硅片上,实现高分辨图形转印的光学曝光设备。自1978年诞生以来,先后经历了 g 线、i 线、248nm、193nm 等几个技术阶段,现已步入了157nm 波长的 F2准分子激光光刻的研究开发阶段,是当今应用最广、技术进步最快、生命力最强的曝光技术。该技术的发展,一直是驱动以 DRAM 为代表的微电子技术进步的核心。在技术规划和投资中,光刻技术一直占据十分显要的位置。技术现状当前,世界上批量生产的集成电路产品是0.25μm线宽的256M DRAM 和0.18μm线宽的 IG DRAM。在此加工范畴可供选择的光刻设备有两种类型,一种是波长为365nm 的 i 线步进扫描 Stepper,另一种则是波长为248nm 的KrF 准分子激光扫描 Stepper。但 i 线 Stepper 进
Stepper is the use of optical projection imaging principle of the IC graphics in the form of step-by-step double exposure on the coated silicon wafer, high-resolution graphics transfer optical exposure equipment. Since its birth in 1978, it has gone through several technical stages such as g-line, i-line, 248nm, 193nm and so on. Now it has entered into the research and development phase of F2 excimer laser lithography with 157nm wavelength. Now it is the most widely used technology The fastest progress, the most vitality of the exposure technology. The development of this technology has always been the core driving the progress of microelectronics represented by DRAM. Lithography has always been a prominent place in technology planning and investment. Current state of the art Currently, the world’s mass-produced integrated circuit products are 0.25M line width 256M DRAM and 0.18um line width IG DRAM. There are two types of lithography equipment to choose from within this processing category, one is the i-line stepper with a wavelength of 365 nm, and the other is a KrF excimer laser with a 248 nm wavelength. But i line Stepper into