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用X射线衍射的动力学理论对磁控溅射法制备的Mo／SiO2多层膜低角X射线衍射谱进行拟合，定量分析了膜层的周期结构和界面粗糙度．同时，用Auger电子能谱证实了多层膜成分的周期性以及比较明晰的层界面随样品厚度的增加，界面粗糙度增加．
The low-angle X-ray diffraction (XRD) spectra of Mo / SiO2 multilayer films prepared by magnetron sputtering were fitted by the kinetic theory of X-ray diffraction. The periodic structure and interfacial roughness of the films were quantitatively analyzed. At the same time, the Auger electron spectroscopy confirmed the periodicity of the multi-layer film composition and the clearer layer interface with the increase of the sample thickness, and the interface roughness increased.