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随着高T_c超导薄膜的成功制备,人们开始着眼于它的实际应用.目前,超导薄膜最有可能得到应用的一个重要方面是微波器件.但微波器件通常要求超导薄膜的厚度均匀面积大于几个平方厘米.因而制备膜厚均匀的大面积高T_c超导薄膜是当前的一个重要的研究课题.至今为止,人们采用了各种镀膜技术来制备大面积超导薄膜,如激光消融技术磁控溅射、化学气相淀积等.文献[1,2]指出,如果不采取适当的措施,激光淀积超导薄膜的厚度分布是极不均匀的,这是因为激光在超导靶上消融的粒子束高度集中在激光消融点靶面法线方向上一个狭窄的区域内.但可通过基片扫描或旋转来改善激光波积的超导薄膜的厚度
With the successful preparation of high Tc superconducting thin films, people began to focus on its practical application.At present, one of the most important aspects of the application of superconducting thin films is the microwave device.But microwave devices usually require uniform thickness of the superconducting thin film More than a few square centimeters.Therefore, it is an important research topic to prepare a large area high Tc superconducting thin film with uniform film thickness so far, various kinds of coating techniques have been used to prepare large area superconducting thin films, such as laser ablation technique Magnetron sputtering, chemical vapor deposition, etc. [1,2] pointed out that the thickness distribution of laser-deposited superconducting films is very inhomogeneous if proper measures are not taken because the laser is on the superconducting targets The ablated particle beam is highly concentrated within a narrow area of the normal to the target surface of the laser ablation spot, but the thickness of the laser-swept superconducting film can be improved by scanning or rotating the substrate