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用磁控溅射工艺在玻璃基片上沉积了银薄膜。用台阶仪、紫外可见光透射光谱、红外反射光谱、扫描电镜、光学显微镜和X射线光电子能谱研究了银膜厚度和溅射沉积气压对膜表面形貌和光学性能的影响,用四探针法测试了银膜层的方块电阻。结果表明,均匀连续和适当厚度的银膜层方块电阻小,相应膜的红外反射率和可见光透射率高;相同厚度的银膜,致密膜的方块电阻小、红外反射率高;在大气环境下,银膜层被腐蚀的机理是,不致密银膜层容易吸附氧气和硫化物,在二者吸附物的共同作用下导致在银薄膜表面出现黄色的斑点和裂纹,从而降低银膜层反射红外线的性能。
Silver films were deposited on glass substrates by magnetron sputtering. The effects of silver film thickness and sputter deposition pressure on the surface morphology and optical properties of the films were investigated by using step-spectroscopy, UV-visible transmission spectroscopy, infrared reflectance spectroscopy, scanning electron microscopy, optical microscopy and X-ray photoelectron spectroscopy. The sheet resistance of the silver layer was tested. The results show that the sheet resistance of silver film with uniform continuous and proper thickness is small, and the infrared reflectance and visible light transmittance of the corresponding film are high. The sheet resistance of silver film and dense film with the same thickness is small and the infrared reflectance is high. Under atmospheric conditions , The mechanism of the silver film being eroded is that the silver film layer is not easy to adsorb oxygen and sulfide and the yellow and blue spots and cracks are formed on the surface of the silver film under the action of the two adsorbed substances so as to reduce the reflection of the infrared ray on the silver film layer Performance.