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基于法布里珀罗(F-P)腔理论建立了一种简单有效的硅绝缘体(SOI)光波导损耗测量方法。该方法采用端面耦合,通过测试波导反射功率谱并利用傅里叶频谱信息,完成波导损耗的测量。推导中指出了无法直接利用反射谱F-P峰峰谷值求解损耗的限制因素。应用该方法实现了对刻蚀深度为750nm和宽度为1200nm的SOI脊形波导损耗的测量,表明该测量方法能够对小尺寸、低损耗波导实现较高精度的损耗测量。
A simple and effective optical waveguide loss measurement method based on Fabry-Perot (F-P) cavity theory is established. The method uses face-to-face coupling to measure the waveguide loss by reflecting the power spectrum through the test waveguide and using the Fourier spectrum information. Derivation pointed out that the direct use of reflection spectrum F-P peak-valley limit for solving the loss factor. The method is applied to measure the SOI ridge waveguide loss at the depth of 750nm and the width of 1200nm, which shows that this method can measure the loss of small size and low loss waveguide with high accuracy.