论文部分内容阅读
前言 上海试剂一厂光刻胶小组的工人、技术人员遵照伟大领袖毛主席关于“中国人民有志气,有能力,一定要在不远的将来,赶上和超过世界先进水平”的教导,发挥了高度的革命热情,破除迷信、解放思想、大胆提出了一条生产“上试一号”胶的新工艺,生产了质量较好的“上试一号”胶。上海光刻胶攻关小组(由上试一厂、上海半导体器件研究所、上无十九厂、上无十四厂、上海冶金研究所等单位组成)对该胶作了大量的工艺摸索和近600片次的测试评定工作,认为该胶的分辨率、抗蚀性、针孔密度等主要指标达到先进水平,是一个质量较优的光刻胶。目前,该胶已在上海普遍应用。上无十四厂用该胶研制成由8200个元件构成的MOSP沟道1024位存储器。上海冶金研究所、上无十九厂等单位也使用该胶研制成和生产了一些中、大规模集成电路。 本文是在鉴定“上试一号”胶性能的基础上写成的。就如何鉴定光刻胶及确定较佳光刻工艺提出一些看法,请同志们批评指正。
Preface The workers and technicians of Shanghai Reagent Factory Photoresist Group followed the teachings of Chairman Mao, the great leader, on “the Chinese people have the ambition and ability to catch up with and surpass the advanced world level in the near future” and played a High degree of revolutionary enthusiasm, get rid of superstition, emancipate the mind, boldly put forward a production of “a test on the first” glue new technology, the production of better quality “on the first test” glue. Shanghai photoresist research group (by the first test of a plant, Shanghai Institute of Semiconductor Devices, on the non-nineteen plants, on the fourteen plants, Shanghai Institute of Metallurgy, and other units) made a lot of glue on the process of exploration and the near 600 times the test assessment work, that the resolution of the plastic, corrosion resistance, pinhole density and other major indicators have reached the advanced level, is a better quality photoresist. At present, the glue has been widely used in Shanghai. No fourteen factory with the glue developed into 8200 components MOSP channel 1024-bit memory. Shanghai Institute of Metallurgy, on the other nineteen factories and other units also use the rubber research and production of a number of large-scale integrated circuits. This article is based on the identification of “on the first trial” glue performance based on the written. On how to identify the photoresist and determine the best lithography process put forward some views, please comrades criticism.