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采用恒电流复合电沉积制备了(Ni–Mo)/TiO2薄膜,对薄膜的表面形貌、晶相结构和光谱特性进行了表征,以罗丹明B为模拟污染物对薄膜的光电催化性能进行了测定,并分析了光电催化机理。结果表明:(Ni–Mo)/TiO2薄膜是粒径为50～100 nm的TiO2纳米粒子相和纳米晶Ni–Mo固溶体相构成的复合薄膜。薄膜具有优异的光电催化活性和显著的光电协同效应,与未加阳极偏压相比,在最佳阳极偏压(0.2 V)下,光催化降解率提高了1.09倍,复合薄膜的光电催化降解率是多孔P25 TiO2/ITO(indium tin oxide)纳米薄膜的2.05倍。复合薄膜光电催化活性的提高,主要源于在薄膜中有效形成了(Ni–Mo)/TiO2异质结和良好的电子通道,它一方面可以促使光生电荷的分离;另一方面加速了氧气与激发电子的还原反应。
(Ni-Mo) / TiO2 films were prepared by galvanostatic galvanostatic deposition. The surface morphology, crystal phase structure and spectral properties of the films were characterized. The photoelectrocatalytic properties of the films were evaluated using rhodamine B as a simulated pollutant Determination, and analysis of the photoelectrocatalytic mechanism. The results show that the (Ni-Mo) / TiO2 thin film is a composite thin film composed of TiO2 nanoparticles with nanocrystalline Ni-Mo solid solution and particle size of 50-100 nm. The films have excellent photocatalytic activity and remarkable photoelectric synergistic effect. Compared with no anode bias, the photocatalytic degradation rate of the films increases by 1.09 times under the optimum anode bias (0.2 V), the photoelectrocatalytic degradation of the composite films 2.05 times the rate of porous P25 TiO2 / ITO (indium tin oxide) nanofilms. The enhancement of the photoelectrocatalytic activity of the composite thin film is mainly due to the effective formation of a (Ni-Mo) / TiO2 heterojunction and a good electron channel in the film, which on the one hand can promote the separation of photogenerated charges; on the other hand, Energize the electron reduction reaction.