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本文报道氯化和氢化的无定形硅(a-Si:H:Cl)样品的拉曼谱和红外谱的测量结果.样品是在H_2和SiCl_4混合气体中用辉光放电方法淀积在晶体硅(c-Si)衬底上的.实验上观察到无序激活的诸声子模式和氢感应的各Si-H 键的振动带.此外,还观察到 Si-Cl键和Si-O 键的振动带.我们识别,在600cm~(-1)处的峰是SiCl_2键的反对称的拉伸振动;540cm~(-1)处的峰是SiCl键的拉伸振动和SiCl_2键的对称拉伸振动模式的叠加.在795cm~(-1)处的峰与氧的沾污有关,与氯的引入无关.
In this paper, the results of Raman spectroscopy and infrared spectroscopy of chlorinated and hydrogenated amorphous silicon (a-Si: H: Cl) samples were reported. The samples were deposited on crystalline silicon by a glow discharge method in a mixed gas of H 2 and SiCl 4 (c-Si) substrate, phonon modes of disordered activation and hydrogen-induced vibrational bands of Si-H bonds were experimentally observed In addition, Si-Cl bond and Si-O bond Vibration zone. We identify that the peak at 600 cm -1 is the antisymmetric stretching vibration of SiCl 2 bond; the peak at 540 cm -1 is the stretching vibration of SiCl bond and the symmetric stretching of SiCl 2 bond Superposition of vibration modes The peak at 795 cm -1 is related to the contamination of oxygen, irrespective of the introduction of chlorine.