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本文研究了脉冲激光溅射镀膜技术沉积WO_3基片在室温下,沉积的WO_3膜部分晶化并部分还原.经热处理,在450℃左右膜层开始晶化,最后形成三斜晶系的WO_3晶化后颗粒在几十到几百纳米之间.本技术沉积的WO_3膜对NO_2气体有非常好的气敏性能,可检测0.1×10~(-6)量级的NO_2气体.WO_3膜的灵敏度随温度降低而增大,但同时响应时间和恢复时间增长.同其它制备技术相比,本技术沉积的WO_3膜显著提高了响应性能:响应时间和恢复时间,它们分别为30_s和70_s.
In this paper, the pulsed laser deposition technique was used to deposit WO_3 substrate, the partially deposited WO_3 film was partially crystallized and partially reduced at room temperature.After heat treatment, the film began to crystallize at about 450 ℃ and finally the triclinic WO_3 crystal was formed After the formation of particles in the tens to hundreds of nanometers.The WO3 deposited by this technology has very good gas sensing properties for NO2 gas and can detect NO2 gas on the order of 0.1 × 10-6.The sensitivity of WO3 membrane With the decrease of temperature, the response time and recovery time increased at the same time.Compared with other preparation techniques, the WO3 film deposited by this technique significantly improved the response performance: response time and recovery time, which were 30_s and 70_s respectively.