论文部分内容阅读
用超高真空磁控溅射设备在不同溅射压强及衬底温度的工艺条件下制备了一系列Ｃｏ／Ｓｉ多层膜．Ｘ射线小角衍射证实所研制的多层膜具有周期调制结构．分别采用不同的理论方法计算了多层膜的周期和折射修正项．表明修正项不再仅对折射效应修正，而应理解为更广义的修正项．并应用广义修正总多层膜厚度Ｂｒａｇｇ公式确定出了主峰之间次峰的级数．
A series of Co / Si multilayers were prepared by using ultra-high vacuum magnetron sputtering equipment under different sputtering pressure and substrate temperature. Small angle X-ray diffraction confirmed that the developed multi-layer film has a periodic modulation structure. Different theoretical methods were used to calculate the periodic and refractive correction of multilayers. This indicates that the correction term is no longer only the correction of the refraction effect, but should be understood as a more generalized correction term. The series of minor peaks between the main peaks were determined by the Bragg formula of generalized modified total multilayer thickness.