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近年来离子注入已经从实验室进入了工厂,作为一种常规工艺在半导体集成电路制作中得到了越来越普遍的应用。离子束设备在金属材料改性、干法蚀刻……等方面也不断得到了新的应用。越来越多的人在从事离子束设备的使用、制造或研究。离子源是其中最关键的部件之一。正确地选择和使用源的工作物质是发挥设备性能,高效率地获得高质量的离子束以及保护设备和操作者安全的重要条件。
In recent years, ion implantation has entered the factory from the laboratory, as a conventional process in the manufacture of semiconductor integrated circuits has been more and more common applications. Ion beam equipment in the modification of metal materials, dry etching ...... also continue to get a new application. More and more people are engaged in the use of ion beam equipment, manufacturing or research. Ion source is one of the most critical components. Proper selection and use of the working substance of the source is an important condition in terms of equipment performance, efficient access to high quality ion beams, and the safety of equipment and operators.