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前言众所周知,就国际范围而言,半导体技术目前正处在大规模集成电路(LSI)向超大规模集成电路(VLSI)迅速发展的重要时期。作为半导体工艺核心的光刻技术,也正在发生着巨大的变化。人们充分认识到,由于电子束和X射线光刻技术所具有的无可比拟的优点,因此是未来最有前途的光刻技术以及下一代图形加工技术的基础。但十分遗憾的是,由于种种难关和障碍,这两
Preface As we all know, in the international arena, semiconductor technology is currently in the large-scale integrated circuit (LSI) to the very large-scale integrated circuits (VLSI) rapid development of an important period. As the core of semiconductor technology lithography, is undergoing tremendous changes. It is well recognized that due to the unparalleled advantages of electron beam and X-ray lithography, it is the basis of the most promising photolithography and next-generation graphics processing technologies of the future. However, it is very regrettable that due to various difficulties and obstacles, both