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设计了一套用于光阴极直流高压电子枪的极高真空系统。首先对电子枪真空腔室的钛阳极、阴极和高压陶瓷分别进行表面处理及烘烤除气后确定材料表面放气率,然后对真空室压强进行模拟计算并确定配泵方案,最后在现场组装、检漏后对真空系统进行调试。调试过程中为了保证不能被直接加热的内部阴极杆在烘烤时充分除气,使用ANSYS-Fluent软件的S2S辐射模型对烘烤过程进行模拟并确定烘烤温度与时间。经过真空调试,电子枪腔内真空度为5.6×10~(-10)Pa,满足其极高真空设计要求。
A very high vacuum system designed for photocathode DC high voltage electron gun was designed. First, the titanium anode, cathode and high voltage ceramic in the vacuum chamber of the electron gun were respectively subjected to the surface treatment and the outgassing after baking to determine the outgassing rate of the material surface, and then the pressure in the vacuum chamber was simulated and the pump plan was confirmed and finally assembled on site. Leakage after the vacuum system debugging. During the debugging process, in order to ensure that the internal cathode rod that can not be heated directly was fully degassed during baking, the baking process was simulated and the baking temperature and time were simulated by using the S2S radiation model of ANSYS-Fluent software. After the vacuum test, the vacuum degree of the electron gun chamber is 5.6 × 10 -10 Pa, which meets the requirements of its extremely high vacuum design.