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介绍了激光物理气相沉积设备的研制及利用所研制的设备和CO2气体激光器在Ni与SiO2基片上沉积Al2O3薄膜的方法．探索了激光物理气相沉积Al2O3薄膜的工艺，分析了Al2O3膜层的结构并初步测试了膜层的绝缘性、高温抗氧化性及耐腐蚀性．
The development of laser physical vapor deposition equipment and the method of depositing Al2O3 film on Ni and SiO2 substrates by using the developed equipment and CO2 gas laser are introduced. The process of laser physical vapor deposition of Al2O3 film was explored. The structure of Al2O3 film was analyzed and the insulation, high temperature oxidation resistance and corrosion resistance of the film were tested.