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用X射线衍射法对直流二极溅射和射频溅射的ZnO薄膜微观结构进行了定量分析.本文采用了薄膜和标准粉末的(002)面衍射强度的比值来表征薄膜的C轴择优取向程度.ZnO薄膜的(002)面回摆曲线给出了C轴的分散度σ和C轴的偏离度m.测试中发现σ和m的空间分布是不对称的,本方法采用了最基本的二维迴摆曲线测量法较全面地描述了C轴的空间分布.ZnO薄膜的平均粒度是用公式D=Kλ/B.cosθ来计算的,对实际测得的ZnO膜(002)面衍射峰的宽化度B进行了仪器宽化度和Kα双线分离的修正.
X-ray diffraction (XRD) was used to quantitatively analyze the microstructure of ZnO thin films by direct current (DC) sputtering and RF sputtering.In this paper, the ratio of the (002) plane diffraction intensity of film and standard powder was used to characterize the C-axis preferred orientation The (002) plane sway curve of ZnO thin film gives the C-axis dispersion σ and the C-axis deviation M. The σ and m spatial distributions are asymmetric and the most basic two The dimension of the C-axis is described more fully by the measurement of the dimension of the pendulum.The mean particle size of the ZnO thin film is calculated by the formula D = Kλ / B cos θ, and the actually measured diffraction peak of the (002) plane of the ZnO film Broadening degree B Instrument wideness and Ka double line correction.