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以甲烷和氢气为气源，用热丝ＣＶＤ法，在ＷＣ－６％Ｃｏ的硬质合金基体上沉积金刚石薄膜。研究了基体表面经抛光、腐蚀、脱碳及镀中间层等不同的预处理对金刚石薄膜与基体的附着性的影响。试验结果表明：基体表面经抛光、腐蚀再经脱碳或镀ＴｉＮ中间层，可改善和提高附着性，金刚石薄膜的形核率和沉积速率有所降低；基体表面只经抛光、腐蚀预处理，金刚石薄膜的形核率和沉积速率较高，结晶性好，但附着性较差；采用分段沉积，可以提高金刚石薄膜的附着性。
Using methane and hydrogen as the gas source, a diamond film was deposited on the cemented carbide substrate of WC-6% Co by hot filament CVD method. The effects of different pretreatments, such as polishing, etching, decarburization and interlayer coating, on the adhesion between the diamond film and the substrate were investigated. The results show that the substrate surface is polished, etched, then decarburized or TiN intermediate layer can be removed to improve and enhance the adhesion. The nucleation rate and deposition rate of the diamond film are reduced. The surface of the substrate is only polished and pretreated by etching, Diamond film nucleation rate and deposition rate is high, good crystallinity, but poor adhesion; the use of segmented deposition, diamond film can improve the adhesion.