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通过对光阴极膜层光学性能的测定和光电发射能力的测量,就能计算出它的光电子逸出深度和逸出几率。这两个参量代表着光电子在膜层中的传输和穿透膜层表面的发射特性。折射率n、衰减率k和膜层厚度d可以利用透过率T和反射率R_T、R_R(R_T、R_R分别为基质和真空界面的反射率)来求得。由透射光和反射光测得光电发射量子效率
By measuring the optical performance of the photocathode layer and measuring the photoelectric emission ability, the photoelectron escape depth and escape probability can be calculated. These two parameters represent the transmission of photoelectrons in the film and the emission characteristics of the surface through the film. Refractive index n, attenuation rate k and film thickness d can be obtained by using transmittance T and reflectances R_T, R_R (R_T, R_R, respectively, reflectances of the substrate and the vacuum interface). Photoemission quantum efficiency was measured from transmitted light and reflected light