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为完成快速、精确的外观轮廓度量,设计了一种新型纳米级精度分光路双频干涉度量系统。系统由低频差双频激光干涉度量模块和微探头及二维工作台两部分组成。微探针以轻敲式接近样品至几十纳米时,受原子力作用发生偏转,利用双频干涉模块度量其纵向偏转量,并对样品进行梳状式度量得到外观形貌。根据双频激光的实际光源,对原有双频干涉度量理论进行了改进提高。进行了系统组建和实验验证。结果表明:系统具有纳米级精度,可用于超精样品外观轮廓度量。
In order to achieve a fast and accurate appearance profile measurement, a new type of nanometer-scale dual-frequency interference metrology system is designed. The system is composed of low frequency difference dual frequency laser interferometer and micro probe and two-dimensional workbench. When the microprobe is tapped to approach tens of nanometers, it is deflected by atomic force, its longitudinal deflection is measured by the dual-frequency interference module, and the shape of the sample is combed to obtain the appearance appearance. According to the actual light source of dual-frequency laser, the original double-frequency interference metric theory is improved and improved. System establishment and experimental verification were carried out. The results show that the system has nanometer accuracy and can be used to measure the appearance of ultra-fine samples.