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采用射频磁控溅射方法制备了单层TiAlN、CrAlN复合薄膜以及不同调制周期和不同层厚比(lTiAlN/lCrAlN)的TiAlN/CrAlN纳米结构多层膜。薄膜采用X射线衍射仪、扫描电子显微镜、显微硬度仪进行表征。结果表明:TiAlN、CrAlN复合薄膜和TiAlN/CrAlN多层膜均为面心立方结构,呈(111)面择优取向。TiAlN/CrAlN多层膜的择优取向与调制周期和层厚比无关。层厚比为1的TiAlN/CrAlN多层膜的硬度依赖于调制周期,在调制周期为8nm时,达到最大;固定TiAlN的厚度为4nm,改变CrAlN层的厚度,在研究范围内,多层膜的硬度随着CrAlN层厚度的增加而增加。探讨了多层膜的致硬机制。TiAlN/CrAlN多层膜抗氧化温度比其组成单层膜高了近200℃,并讨论了其抗氧化机制。
Single-layer TiAlN and CrAlN composite films and TiAlN / CrAlN nanostructured multi-layer films with different modulation periods and different layer thicknesses (lTiAlN / lCrAlN) were prepared by RF magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy and microhardness tester. The results show that TiAlN, CrAlN composite films and TiAlN / CrAlN multilayer films are all face-centered cubic structures with a preferred orientation of (111) plane. The preferred orientation of the TiAlN / CrAlN multilayers is independent of the modulation period and layer thickness ratio. The hardness of TiAlN / CrAlN multilayers with a layer thickness ratio of 1 depends on the modulation period and reaches the maximum at a modulation period of 8 nm. The thickness of the fixed TiAlN layer is 4 nm and the thickness of the CrAlN layer is varied. Within the study range, The hardness increases with the increase of CrAlN layer thickness. The mechanism of multi-layer film hardening was discussed. The anti-oxidation temperature of TiAlN / CrAlN multilayers is almost 200 ℃ higher than that of monolayer films. The anti-oxidation mechanism is also discussed.