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以非离子表面活性剂F127为模板,正硅酸乙酯为硅源,在酸性条件下合成胶体通过溶剂蒸发诱导自组装的方式制备了单层薄膜,经氨气预处理和高温煅烧除去模板剂后得到介孔氧化硅薄膜.利用同步辐射掠入射X射线衍射、氮气吸脱附和透射电子显微镜研究了薄膜的介观结构,发现薄膜内部呈现有序的笼型孔道结构,可归属于体心立方排列.通过紫外-可见光谱仪和椭偏仪研究了薄膜的光学性质,在1053 nm波长处光学透射率可达99.9%以上,折射率可依F127/Si摩尔比而变.采用原子力显微镜研究了薄膜的表面性质,薄膜表面平整,平均粗糙度仅为1.2 nm.使用1053 nm激光测试薄膜的激光损伤阈值,所有样品阈值均大于25 J·cm~(-2)(脉宽为1 ns).该薄膜制备方法有望成为一种大口径减反射膜制备新方法.
A non-ionic surfactant F127 as a template, tetraethyl orthosilicate as a silicon source, under acidic conditions, colloidal self-assembly by solvent evaporation prepared a single layer film, the ammonia pretreatment and high temperature calcination to remove the template Mesoporous silica films were obtained.The mesoscopic structure of the films was studied by synchrotron radiation grazing incidence X-ray diffraction, nitrogen adsorption and desorption and transmission electron microscopy, and the orderly cage-like cell structure was found in the films, belonging to the body-centered cubic The optical properties of the films were studied by UV-Vis spectroscopy and ellipsometry.The optical transmittance of the films was 99.9% at 1053 nm and the refractive index was changed according to the molar ratio of F127 / Si.The films were characterized by atomic force microscopy The surface roughness of the film was only 1.2 nm.The threshold of all the samples was greater than 25 J · cm -2 with a pulse width of 1 ns using the laser damage threshold of 1053 nm laser. Thin-film preparation method is expected to become a new method for preparing large-aperture anti-reflection coatings.