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BEPCII改进工程需要更高流强的电子枪。新电子枪系统的物理设计、机械设计、控制系统设计等均进行了描述。电子枪的设计发射电流在脉宽为1 ns时大于10 A,重复频率50 Hz。将会采用脉冲电源来为电子枪提供最高200 kV的脉冲高压。在设计阶段,电子枪的几何结构和束流传输过程利用计算机模拟进行了优化。EGUN和DGUN的计算结果表明导流系数为0.22μA.V-3/2,电子枪出口的发射度为16π.mm.mrad。PARMELA的模拟结果表明束流能顺利地传输至第一根加速管末端,捕获效率为67%,出口的均方根发射度为25 mm.mrad。基于EPICS平台的电子枪控制系统设计也已完成,提供了全新的双脉冲运行模式和2.5μs长脉冲运行模式。
BEPCII improvement project requires a higher flow of electron gun. The new electronic gun system’s physical design, mechanical design, control system design Dengjun described. The electron gun’s designed emission current is greater than 10 A at a pulse width of 1 ns and a repetition frequency of 50 Hz. Pulsed power supplies will be used to provide high voltage pulses up to 200 kV for electron guns. In the design phase, the geometry of the electron gun and the beam transport process were optimized using computer simulations. The calculated results of EGUN and DGUN indicate that the flow conductivity is 0.22 μA.V-3/2 and that the exit of the electron gun is 16π.mm.mrad. PARMELA simulation results show that the beam can be successfully transmitted to the end of the first accelerating tube, the capture efficiency of 67%, the exit of the root mean square emission of 25 mm.mrad. Electronic gun control system design based on EPICS platform has also been completed, providing a new double pulse operation mode and 2.5μs long pulse operation mode.