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本文运用Ｌａｎｓｍｕｉｒ静电探针技术，对真空电弧镀膜过程中，基片鞘层附近区域的电子能量电子密度值及其受基片偏压影响而改变的关系进行了实验测量。结果表明，在环境压力为５．３２Ｐａ电弧电流为７５Ａ，进行钛金属薄膜沉积时，等离子体参数的特征值表征为电子能量值１～５ｅＶ．电子密度值１０１１ｃｍ－３左右；且随着基片偏压值的增大，电子能量有缓慢的增加，而电子密度则显著下降。最后，对测量结果进行了分析与讨论。
In this paper, Lansmuir electrostatic probe technique was used to measure the electron energy density in the vicinity of the substrate sheath during the vacuum arc coating process and its relationship with the substrate bias voltage. The results show that the eigenvalue of the plasma parameters is characterized by the electron energy value of 1 ~ 5eV when the arc current of 5.32Pa is 75A and the titanium metal film is deposited. The electron density is about 1011cm-3. With the increase of substrate bias voltage, the electron energy increases slowly and the electron density decreases significantly. Finally, the measurement results were analyzed and discussed.