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本文针对光波导互连背板的垂直耦合需求，提出了一种基于准分子激光制备45°微反射镜的新方法──激光阶梯刻蚀法。介绍了激光阶梯刻蚀法制备45°微反射镜的技术工艺流程，通过优化准分子激光加工参数制备微反射镜样品；详细分析了所制备的样品参数如反射面粗糙度、几何尺寸对微镜反射性能的影响；进一步地利用微反射镜样品进行垂直耦合实验，并深入讨论了影响系统损耗的主要因素，实验结果表明微反射镜样品所造成的损耗约3.5 d B，该技术有望在大尺寸光波导互连背板耦合器件研制方面得到广泛应用。
Aiming at the requirement of vertical coupling of optical waveguide interconnection backplane, a new method based on excimer laser to prepare 45 ° micromirror is proposed. The technological process of preparing the 45 ° micromirror by the laser step etching method is introduced. The micromirror sample is prepared by optimizing the parameters of the excimer laser processing. The parameters of the sample such as the roughness of the reflecting surface, The effect of the micro-mirror sample on the vertical coupling is discussed. The main factors affecting the system loss are discussed in depth. The experimental results show that the loss caused by the micro-mirror sample is about 3.5 d B, Optical waveguide interconnection backplane coupling device development has been widely used.