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本文主要论述磁控溅射离子镀技术是金属材料表面合金化的一种新方法。电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。X 射线衍射分析证明,磁控溅射离子镀膜不单纯是靶材元素组成的膜,而是含有靶材元素和基体元素相互作用而形成的化合物相的合金膜;在一定的实验条件下,腹的相组成主要是由靶(阴极)材料、基板材料和基板负偏压所决定的。
This paper mainly discusses the magnetron sputtering ion plating technology is a new method of metal alloy surface alloying. Electron probe analysis showed that the metal matrix magnetron sputtering ion plating metal film is a mixture of target element and substrate element. X-ray diffraction analysis proved that magnetron sputtered ion plating is not only a film composed of target elements, but an alloy film containing a compound phase formed by the interaction of a target element and a matrix element. Under certain experimental conditions, The phase composition is mainly determined by the target (cathode) material, the substrate material and the substrate negative bias.