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在不同电流密度下制备了铈掺杂ZL108合金的微弧氧化膜,研究了电流密度对铈掺杂铝合金微弧氧化膜性能的影响。利用扫描电镜观察微弧氧化膜的表面形貌,采用能谱仪分析膜层元素,利用极化曲线评定耐蚀性,并对微弧氧化膜的厚度、表面硬度进行了测定。结果表明,随着电流密度的增加,氧化电压、膜层厚度均增加,而硬度先上升后降低;微弧氧化膜表面微孔数量及尺寸不断增加,最后出现块状凸起并有裂纹产生。Ce元素在微弧氧化膜表面的分布随电流密度增加而不断均匀。当电流密度为10 A/dm~2时Ce含量最高,此时微弧氧化膜耐蚀性最好。
The micro-arc oxidation films of cerium-doped ZL108 alloy were prepared at different current densities. The effects of current density on the micro-arc oxidation film of cerium-doped aluminum alloy were investigated. The surface morphology of MAO film was observed by scanning electron microscopy. The element of film was analyzed by EDS. The corrosion resistance was evaluated by polarization curve. The thickness and surface hardness of MAO film were measured. The results show that with the increase of current density, the oxidation voltage and film thickness increase, while the hardness first increases and then decreases. The number and size of micro-arc oxidation film surface pores increase, and finally, the block-like protrusions and cracks occur. The distribution of Ce element on the surface of micro-arc oxidation film is uniform with the increase of current density. When the current density is 10 A / dm ~ 2, the content of Ce is the highest, and the corrosion resistance of MAO film is the best.