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目前国内对于测定微量硅,都采用硅钼蓝光度法。灵敏度较高,方法较简便。但受酸度影响较大,不大稳定,特别是痕量硅的分析操作不易掌握。用脉冲极谱法测定硅,国外已有报导。我们用国产JP-MI型脉冲极谱仪测定了微量的硅,并拟定了测定纯镍和镍铜合金中微量硅的分析方法。实验部分 (一)仪器和主要试剂 JP-MI型脉冲极谱仪(吉林8270厂制)。柠檬酸铵溶液:溶解21克柠檬酸铵于1升水中,用1M盐酸调节至pH为2.7. 硅标准溶液(1毫升含硅0.1毫克):取0.2139克二氧化硅(预先在1000℃灼烧1小时)置
At present, for the determination of trace silicon, silicon molybdenum blue luminosity method are used. High sensitivity, the method is more convenient. However, it is greatly affected by the acidity and is not stable. In particular, trace silicon analysis is not easy to grasp. Pulse polarography for the determination of silicon has been reported abroad. We use the domestic JP-MI pulse polarography trace a trace of silicon, and developed a determination of trace nickel and nickel-copper alloy analysis of trace silicon. Experimental part (A) instrument and the main reagent JP-MI pulse polarography (Jilin 8270 factory system). Ammonium citrate solution: Dissolve 21 grams of ammonium citrate in 1 liter of water and adjust to pH 2.7 with 1 M hydrochloric acid. Silica standard solution (1 milliliter of silicon 0.1 milligram): Take 0.2139 grams of silica (pre-fired at 1000 ° C 1 hour) set