新的隔离工艺——等平面工艺

• 作 者: 风雷
• 出 处: 半导体情报
• 发表日期: 1971年06期
• 关键词: 等平面工艺 隔离工艺 等平面隔离 随机存取存储器 费尔 单位面积 研究和发展 成品率 随机存取 元件

最近,国外发展了一种新的隔离工艺——等平面工艺。据美帝费尔查尔德公司宣称,这是十年来隔离工艺中的第一次重要进展。目前这种工艺仍处于研究和发展阶段,费尔查尔德公司正在用等平面隔离工艺制备258位和1024位的随机存取存储器。等平面隔离工艺可以减小元件的尺寸,在片子上的单位面积内可以容纳更多的位数,而且可以大大提高成品率。

Recently, a new isolation technology has been developed abroad - such as the planar technology. According to the US-based Fairchild company, this is the first major advance in isolation technology for a decade. At present, the process is still in the research and development stage, and Fairchild is using equal-plane isolation process to prepare 258-bit and 1024-bit random access memory. Equal plane isolation process can reduce the size of components, the unit can accommodate more bits per unit area, and can greatly improve the yield.