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表面织构是一种有效降低表面反射率、提高硅基太阳能电池效率的方法.采用等离子体浸没离子注入的方法制备了黑硅抗反射层.分别通过原子力显微镜和紫外-可见-近红外分光光度计对黑硅样品表面形貌和反射率进行分析,结果发现黑硅样品表面布满了高度为0-550 nm的山峰状结构,结构层中硅体积分数和折射率随抗反射层厚度增加而连续降低.在:300—1000nm波段范围内,黑硅样品的加权平均反射率低至6.0%.通过传递矩阵方法对黑硅样品反射谱进行模拟,得到的反射谱与实测反射谱非常符合.
Surface texture is an effective method to reduce the surface reflectance and improve the efficiency of silicon-based solar cells.An anti-reflection layer of black silicon was prepared by plasma immersion ion implantation.The microstructure of the anti-reflection layer was characterized by atomic force microscopy and UV-Vis-NIR spectroscopy The surface topography and reflectivity of black silicon were analyzed. The results showed that the surface of black silicon was covered with mountain-like structure with a height of 0-550 nm. The volume fraction and refractive index of silicon in the structure increased with the thickness of the anti-reflective layer The average reflectance of black silicon samples is as low as 6.0% in the range of 300-1000 nm.The reflection spectra of black silicon samples are simulated by transfer matrix method, and the obtained reflection spectra are in good agreement with the measured reflection spectra.