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电子与靶相互作用产生X射线源的正确模拟是精确模拟辐射照相过程的关键。在说明击靶电子束的束斑尺寸和发射度两个重要参数及其相互关系的基础上,给出了轴对称情形下电子束分布为Guass分布、均匀分布(KV分布)和水袋分布(WB)的抽样方法。通过举例说明了这些抽样方法的正确性,而且在实际辐射照相的Monte Carlo模拟中必须考虑电子束的发射度。
Electron-Target Interactions Proper modeling of an X-ray source is the key to accurately simulating a radiographic process. Based on the description of two important parameters of beam spot size and emissivity of target electron beam and their correlations, the electron beam distribution is Guass distribution, uniform distribution (KV distribution) and water bag distribution WB) sampling method. The correctness of these sampling methods is illustrated by examples, and the emissivity of electron beams must be taken into account in Monte Carlo simulations of actual radiography.