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据美刊《电子封装与生产》1977年第九期报导,美国国家标准局最近求助于一些工业公司,谋求制定一项新发展的物理标准,从而建立起能确保精密测量集成电路照相图形的线条宽度的测试方法。这项计划是针对那些照相掩模、集成电路和线条宽度测量设备的制造厂家而制定的。根据予期,由于使用了这一测试方法和校准标准,将使每一个参加的组织确定其相对的测量能力和改进程度。在目前美国家标准局的计划中,研究人员已发现照相掩模测量的差别首先是由于每一
According to the American Journal of Electronic Packaging and Manufacturing, No. 9, 1977, the U.S. National Bureau of Standards has recently turned to some industrial companies for a new physical standard to establish a line of photogrammetry that will ensure precision measurement of integrated circuits The width of the test method. The program is for those who mask the photolithography, integrated circuit and line width measurement equipment manufacturers to develop. By the due date, the use of this test methodology and calibration standards will allow each participating organization to determine its relative measurement capability and degree of improvement. In the current plan of the U.S. Bureau of Standards and Standards, researchers have found that the differences in photographic mask measurements are due in the first place to each