,Effects of Substrate Temperature on Helium Content and Microstructure of Nanocrystalline Titanium F

• 作 者: PANG Hong-Chao LUO Shun-Zhong LONG Xing-Gui AN Zhu LIU Ning DUAN Yan-Min WU Xing-Chun YANG Ben-Fu WANG Pei-Lu ZHENG Si-Xiao
• 机 构: Key laboratory of Radiation Physics and Technology of MOE, Institute of Nuclear Science and Technolo
• 出 处: 中国物理快报（英文版）
• 发表日期: 2006年12期

Helium-chargej nanocrystalline titanium films have been deposited by He-Ar magnetron co-sputtering. The effects of substrate temperature on the helium content and microstructure of the nanocrystalline titanium films have been studied. The results indicate that helium atoms with a high concentration are evenly incorporated in the deposited titanium films. When the substrate temperature increases from 60°C to 350°C while the other depositionparameters are fixed, the helium content decreases gradually from 38.6 at. % to 9.2 at. %, which proves that nanocrystalline Ti films have a great helium storage capacity. The 2θ angle of the Bragg peak of (002)crystal planes of the He-charged Ti film shifts to a lower angle and that of (100) crystal plane is unchanged as compared with that of the pure Ti film, which indicates that the lattice parameter c increases and a keeps at the primitive value. The grain refining and helium damage result in the diffraction peak broadening.