,Influence of Annealing Temperature on Structure, Optical Loss and Laser-Induced Damage Threshold of

• 作 者: TIAN Guang-Lei WU Shi-Gang YANG Lu-Yun SHU Kang-Ying QIN Lai-Shun SHAO Jian-Da
• 机 构: College of Material Science and Engineering, China Jiliang University, Hangzhou 310018“,”Shanghai In
• 出 处: 中国物理快报（英文版）
• 发表日期: 2007年10期

TiO2 thin films are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for 4 h, the spectra and XRD pattes of the TiO2 thin film are obtained.Weak absorption of coatings is measured by the surface thermal lensing technique, and laser-induced damage threshold (LIDT) is determined. It is found that with the increasing annealing temperature, the transmittance of TiO2 films decreases. Especially when coatings are annealed at high temperature over 1173 K, the optical loss is very serious. Weak absorption detection indicates that the absorption of coatings decreases firstly and then increases, and the absorption and defects play major roles in the LIDT of TiO2 thin films.