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热蒸发或溅射制得的光学透明介质膜,由于它的渗透和不稳定,使其在许多应用上受到限制。本文报导了由离子束辅助淀积的介质保护膜,与通常淀积技术制得的薄膜相比具有相当大的改进。这一结论能用离子辅助淀积薄膜的填充密度比通常蒸镀方法获得的松散柱状微细结构膜层的填充密度大来解释。另外,金属膜层用离子轰击获得相当稳定的结构,并大大改善了膜层的附着力。基底表面的光洁度影响了这些膜层的抗化学腐蚀能力。
Optical transparent dielectric films made by thermal evaporation or sputtering have limitations in many applications due to their infiltration and instability. This paper reports a media protection film assisted by ion beam deposition that offers considerable improvements over films made by conventional deposition techniques. This conclusion can be explained by the fact that the packing density of the ion assisted deposition film is larger than the packing density of the loosely packed columnar microstructure film obtained by the usual vapor deposition method. In addition, the metal film layer with ion bombardment obtained a fairly stable structure, and greatly improved the adhesion layer. The finish of the substrate surface affects the chemical resistance of these films.