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化学刻蚀是提升熔石英光学元件抗激光损伤性能的重要后处理技术之一,但刻蚀后熔石英表面附着的沉积物对其表面质量、透射性能和抗激光损伤性能有很大影响。使用光学显微镜和原子力显微镜表征了化学刻蚀后附着于熔石英表面的沉积物的微观形貌,并分析了其形成机理;X射线能谱分析表明化学刻蚀后熔石英表面沉积物主要由Fe,Ni,Al等元素的金属盐组成。损伤阈值测试结果表明熔石英表面高密度沉积物区域的损伤阈值明显低于非沉积物区域,沉积物对熔石英光学元件的抗激光损伤性能产生严重影响,它们是诱导熔石英激光损伤的前驱体。
Chemical etching is one of the important post-treatment techniques to improve the laser damage resistance of fused silica optical components. However, the deposits on the surface of fused quartz have a great influence on the surface quality, transmission performance and laser damage resistance. The microstructure of the deposits adhered to the surface of fused silica after chemical etching was characterized by optical microscope and atomic force microscope, and the formation mechanism was analyzed. X-ray energy spectrum analysis showed that the surface deposits of fused quartz mainly consist of Fe , Ni, Al and other elements of the metal salt composition. The damage threshold test results show that the damage threshold of high-density sediment on the surface of fused silica is obviously lower than that of non-sediment, and the sediments have a significant impact on the laser damage resistance of fused silica. They are precursors to induce laser damage of fused silica .